ELIA is excited to announce that the ETHO Technical Community Conference will be held from 22 - 24 February 2023 in London, UK. Hosted by the Royal College of Art (RCA) in collaboration with local ETHO partners across London and the South of England. The ETHO Core Group invites ELIA member colleagues from all artistic disciplines to explore technical teaching and to contribute to what promises to be an experiential, and memorable programme.
ETHO Technical Community Conference 2023: Pick & Mix, addresses the emerging role of technical teaching in Art, Design and Performing Arts. With this conference, the aim is to question and share knowledge, experiences and best practices of how technical and practical skills can be implemented in the teaching of future artists.
Gather together with your international colleagues, make valuable connections and learn new ways to make your working life better.
Registrations are now open!
We invite technical managers, technical heads, technicians and educators involved in technical services or technical teaching from ELIA member institutions to join us in London or online. Please note that places are limited, so be quick to reserve your spot!
In-person participation
Registration fee (in-person pass): €95 (incl. lunch, drinks & nibbles on Wednesday, coffee breaks, materials, event support, networking opportunities).
Deadline for registrations: 14 February 2023
Please note, that due to the limited capacity of this conference, and to enable as many institutions as possible to participate, there will be an attendance limit of 5 in-person participants per institution.
Institutions that wish to register more than 5 participants will be placed on a waiting list. For more information on the waiting list, please contact Janja Skerget at janja.ferenc(at)elia-artschools.org. If capacity allows, extra seats will be allocated.
Online participation
Online participation will be available free of charge. Registrations for online participation will open at a later date. Stay tuned for further details.